Image of smallest structures

UV light makes it possible to pattern very small structures on wafers. The shorter the wavelength, the smaller the pattern.

1970s
Use of ultraviolet
434 nm mercury lamp

1980s
Use of ultraviolet
365 nm mercury lamp

1990s
Use of ultraviolet
248 nm excimer laser

2010s (to date)
Use of ultraviolet
193 nm excimer laser

Since 2017, an entirely new light source has made it possible to produce even smaller structures: Extreme Ultraviolet (EUV) light.

The EUV light at 13 nm is generated by a tin plasma excited by a CO₂ laser. A set of highly accurate mirrors precisely images the EUV light onto the wafer.

A very warm thank you to all the companies and institutes that made this publication possible.

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